METHOD AND APPARATUS FOR ION-PLASMA DEPOSITION BY SPRAYING

The ion plasma vapour deposition process comprises… introducing a product (6) into the vacuum chamber (1),… evacuating active gases from the vacuum chamber (1) until the fore-vacuum has been attained,… shutting off the fore-evacuation pump (14),… introducing an inert gas into the vacuum chamber (1),...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PETRAKOV VLADIMIR P,SU, DOMRACHEV VLADIMIR A,SU, BARKDON DAVID I,SU, MINKIN GENNADIJ P,SU, SHAGUN VLADIMIR A,SU, BALYKIN PAVEL S,SU
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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