METHOD AND APPARATUS FOR ION-PLASMA DEPOSITION BY SPRAYING

The ion plasma vapour deposition process comprises… introducing a product (6) into the vacuum chamber (1),… evacuating active gases from the vacuum chamber (1) until the fore-vacuum has been attained,… shutting off the fore-evacuation pump (14),… introducing an inert gas into the vacuum chamber (1),...

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Hauptverfasser:	PETRAKOV VLADIMIR P,SU, DOMRACHEV VLADIMIR A,SU, BARKDON DAVID I,SU, MINKIN GENNADIJ P,SU, SHAGUN VLADIMIR A,SU, BALYKIN PAVEL S,SU
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The ion plasma vapour deposition process comprises… introducing a product (6) into the vacuum chamber (1),… evacuating active gases from the vacuum chamber (1) until the fore-vacuum has been attained,… shutting off the fore-evacuation pump (14),… introducing an inert gas into the vacuum chamber (1),… evacuating the active gases from the vacuum chamber until the working pressure is reached,… vapour-depositing a coating onto the product (6) under an inert gas and… after vapour deposition of the coating, interrupting the evacuation of the active gases from the vacuum chamber (1) and admitting air thereinto, the subsequent evacuation of the air from the vacuum chamber being carried out to a pressure of 6...66 Pa. … The system for carrying out the process makes use of the unit for generating a high vacuum with a magnetron pump (16) which is connected to the vacuum chamber (1) via a block valve (18), while the inert-gas inlet appliance (26) is connected to the magnetron pump (16) which is provided with a device (24) for monitoring the residual atmosphere. … The invention can be used in vacuum vapour deposition technology. ……