LIGHT-SENSITIVE COMPOUNDS IN VACUUM PHOTOLITHOGRAPHIC PROCESSES
FIELD: organic chemistry. SUBSTANCE: product: 1-benzylthio-1-piperidino-1-nitro-3,4,4-trichloro-1,3-butadiene used as a light-sensitive compound in vacuum photolithographic processes. Proposed compound provides improved etching selectivity (by 2.4- fold) without backing thermostatic control (in the...
Gespeichert in:
| Hauptverfasser: | , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; rus |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Azarko V.A Potkin V.I Agabekov V.E Gudimenko Ju.I Kaberdin R.V Mitskevich N.I Ol'dekop Ju.A |
| description | FIELD: organic chemistry. SUBSTANCE: product: 1-benzylthio-1-piperidino-1-nitro-3,4,4-trichloro-1,3-butadiene used as a light-sensitive compound in vacuum photolithographic processes. Proposed compound provides improved etching selectivity (by 2.4- fold) without backing thermostatic control (in the known case at cooling up to -70 C). Also, organic films were removed from backing completely. EFFECT: enhanced selectivity of etching.
Изобретение касается применения 1-бензилтио-1-пиперидино-2-нитро-3, 4,4-трихлор-1,3-бутадиена - светочувствительного соединения в вакуумных фотолитографических процессах, в которых достигается лучашая селективность травления (в 2,4 раза) без необходимости термтсатирования подложки (в известном случае ведут охладдение до -70C. Кроме того, органические пленки удаляются с подложки полностью. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_SU1351426A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>SU1351426A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_SU1351426A13</originalsourceid><addsrcrecordid>eNrjZLD38XT3CNENdvUL9gzxDHNVcPb3DfAP9XMJVvD0UwhzdA4N9VUI8PAP8ffxDPHwdw9yDPDwdFYICPJ3dg0Odg3mYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxwaGGxqaGJkZmjobGRCgBAH4-Kr4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LIGHT-SENSITIVE COMPOUNDS IN VACUUM PHOTOLITHOGRAPHIC PROCESSES</title><source>esp@cenet</source><creator>Azarko V.A ; Potkin V.I ; Agabekov V.E ; Gudimenko Ju.I ; Kaberdin R.V ; Mitskevich N.I ; Ol'dekop Ju.A</creator><creatorcontrib>Azarko V.A ; Potkin V.I ; Agabekov V.E ; Gudimenko Ju.I ; Kaberdin R.V ; Mitskevich N.I ; Ol'dekop Ju.A</creatorcontrib><description>FIELD: organic chemistry. SUBSTANCE: product: 1-benzylthio-1-piperidino-1-nitro-3,4,4-trichloro-1,3-butadiene used as a light-sensitive compound in vacuum photolithographic processes. Proposed compound provides improved etching selectivity (by 2.4- fold) without backing thermostatic control (in the known case at cooling up to -70 C). Also, organic films were removed from backing completely. EFFECT: enhanced selectivity of etching.
Изобретение касается применения 1-бензилтио-1-пиперидино-2-нитро-3, 4,4-трихлор-1,3-бутадиена - светочувствительного соединения в вакуумных фотолитографических процессах, в которых достигается лучашая селективность травления (в 2,4 раза) без необходимости термтсатирования подложки (в известном случае ведут охладдение до -70C. Кроме того, органические пленки удаляются с подложки полностью.</description><language>eng ; rus</language><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS</subject><creationdate>1996</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19961227&DB=EPODOC&CC=SU&NR=1351426A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19961227&DB=EPODOC&CC=SU&NR=1351426A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Azarko V.A</creatorcontrib><creatorcontrib>Potkin V.I</creatorcontrib><creatorcontrib>Agabekov V.E</creatorcontrib><creatorcontrib>Gudimenko Ju.I</creatorcontrib><creatorcontrib>Kaberdin R.V</creatorcontrib><creatorcontrib>Mitskevich N.I</creatorcontrib><creatorcontrib>Ol'dekop Ju.A</creatorcontrib><title>LIGHT-SENSITIVE COMPOUNDS IN VACUUM PHOTOLITHOGRAPHIC PROCESSES</title><description>FIELD: organic chemistry. SUBSTANCE: product: 1-benzylthio-1-piperidino-1-nitro-3,4,4-trichloro-1,3-butadiene used as a light-sensitive compound in vacuum photolithographic processes. Proposed compound provides improved etching selectivity (by 2.4- fold) without backing thermostatic control (in the known case at cooling up to -70 C). Also, organic films were removed from backing completely. EFFECT: enhanced selectivity of etching.
Изобретение касается применения 1-бензилтио-1-пиперидино-2-нитро-3, 4,4-трихлор-1,3-бутадиена - светочувствительного соединения в вакуумных фотолитографических процессах, в которых достигается лучашая селективность травления (в 2,4 раза) без необходимости термтсатирования подложки (в известном случае ведут охладдение до -70C. Кроме того, органические пленки удаляются с подложки полностью.</description><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1996</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD38XT3CNENdvUL9gzxDHNVcPb3DfAP9XMJVvD0UwhzdA4N9VUI8PAP8ffxDPHwdw9yDPDwdFYICPJ3dg0Odg3mYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxwaGGxqaGJkZmjobGRCgBAH4-Kr4</recordid><startdate>19961227</startdate><enddate>19961227</enddate><creator>Azarko V.A</creator><creator>Potkin V.I</creator><creator>Agabekov V.E</creator><creator>Gudimenko Ju.I</creator><creator>Kaberdin R.V</creator><creator>Mitskevich N.I</creator><creator>Ol'dekop Ju.A</creator><scope>EVB</scope></search><sort><creationdate>19961227</creationdate><title>LIGHT-SENSITIVE COMPOUNDS IN VACUUM PHOTOLITHOGRAPHIC PROCESSES</title><author>Azarko V.A ; Potkin V.I ; Agabekov V.E ; Gudimenko Ju.I ; Kaberdin R.V ; Mitskevich N.I ; Ol'dekop Ju.A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SU1351426A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; rus</language><creationdate>1996</creationdate><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Azarko V.A</creatorcontrib><creatorcontrib>Potkin V.I</creatorcontrib><creatorcontrib>Agabekov V.E</creatorcontrib><creatorcontrib>Gudimenko Ju.I</creatorcontrib><creatorcontrib>Kaberdin R.V</creatorcontrib><creatorcontrib>Mitskevich N.I</creatorcontrib><creatorcontrib>Ol'dekop Ju.A</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Azarko V.A</au><au>Potkin V.I</au><au>Agabekov V.E</au><au>Gudimenko Ju.I</au><au>Kaberdin R.V</au><au>Mitskevich N.I</au><au>Ol'dekop Ju.A</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LIGHT-SENSITIVE COMPOUNDS IN VACUUM PHOTOLITHOGRAPHIC PROCESSES</title><date>1996-12-27</date><risdate>1996</risdate><abstract>FIELD: organic chemistry. SUBSTANCE: product: 1-benzylthio-1-piperidino-1-nitro-3,4,4-trichloro-1,3-butadiene used as a light-sensitive compound in vacuum photolithographic processes. Proposed compound provides improved etching selectivity (by 2.4- fold) without backing thermostatic control (in the known case at cooling up to -70 C). Also, organic films were removed from backing completely. EFFECT: enhanced selectivity of etching.
Изобретение касается применения 1-бензилтио-1-пиперидино-2-нитро-3, 4,4-трихлор-1,3-бутадиена - светочувствительного соединения в вакуумных фотолитографических процессах, в которых достигается лучашая селективность травления (в 2,4 раза) без необходимости термтсатирования подложки (в известном случае ведут охладдение до -70C. Кроме того, органические пленки удаляются с подложки полностью.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; rus |
| recordid | cdi_epo_espacenet_SU1351426A1 |
| source | esp@cenet |
| subjects | AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS |
| title | LIGHT-SENSITIVE COMPOUNDS IN VACUUM PHOTOLITHOGRAPHIC PROCESSES |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T18%3A35%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Azarko%20V.A&rft.date=1996-12-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ESU1351426A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |