ELECTROPLATING APPARATUS AND METHOD USING A COMPRESSIBLE CONTACT
A metal plating apparatus is described which includes a compressible member having a conductive surface covering substantially all of the surface of the substrate to be plated. The plating current is thereby transmitted over a wide area of the substrate, rather than a few localized contact points. T...
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creator | CYPRIAN EMEKA UZOH ERICK GREGORY WALTON DANIEL CHARLES EDELSTEIN PETER S LOCKE JAMES E FLUEGEL LARA SANDRA COLLINS HARIKLIA DELIGIANNI JOSEF WARREN KOREJWA DEAN S CHUNG WILLIAM E CORBIN |
description | A metal plating apparatus is described which includes a compressible member having a conductive surface covering substantially all of the surface of the substrate to be plated. The plating current is thereby transmitted over a wide area of the substrate, rather than a few localized contact points. The compressible member is porous so as to absorb the plating solution and transmit the plating solution to the substrate. The wafer and compressible member may rotate with respect to each other. The compressible member may be at cathode potential or may be a passive circuit element. |
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The plating current is thereby transmitted over a wide area of the substrate, rather than a few localized contact points. The compressible member is porous so as to absorb the plating solution and transmit the plating solution to the substrate. The wafer and compressible member may rotate with respect to each other. The compressible member may be at cathode potential or may be a passive circuit element.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
title | ELECTROPLATING APPARATUS AND METHOD USING A COMPRESSIBLE CONTACT |
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