Multi-segment global alignment mark

A multi-segment alignment mark useful for a variety of processes is described. The multi-segment alignment mark comprises a plurality of segments wherein each of the segments comprises a series of sub-segments wherein each of the sub-segments comprises a series of spaces and lines, each sub-segment...

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Bibliographische Detailangaben
Hauptverfasser:	CHEUNGING ZADIG LAM, CHAI ANG KAY, EE NEOH SOON, BOON TAN JUAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A multi-segment alignment mark useful for a variety of processes is described. The multi-segment alignment mark comprises a plurality of segments wherein each of the segments comprises a series of sub-segments wherein each of the sub-segments comprises a series of spaces and lines, each sub-segment having the same width but having a different number of spaces and lines within the width depending on the relative width of the spaces and lines. A wafer stepper detects signals from each of the sub-segments and uses the best signal to achieve alignment.