SYSTEM AND METHOD FOR USING A TWO PART COVER FOR PROTECTING A RETICLE

SYSTEM AND METHOD FOR USING A TWO PART COVER FOR PROTECTING A RETICLE

OF THE DISCLOSUREA system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held...

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Bibliographische Detailangaben
Hauptverfasser: JONATHAN H. FEROCE, WOODROW J. OLSEN, DUANE P. KISH, ERIK R. LOOPSTRA, SANTIAGO DEL PUERTO, ABDULLAH ALIKHAN, ANDREW MASSAR
Format: Patent
Sprache:eng
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Zusammenfassung:OF THE DISCLOSUREA system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.[Figure 12]