COMPOSITION FOR POLISHING GLASS SUBSTRATE, AND POLISHING SLURRY

OF THE DISCLOSUREA composition for polishing glass substrate comprising components (A), (B) and optionally (C) and/or (D), and polishing 5 slurry comprising the composition and abrasive grains.a tetrazole derivative having at least one group selected from mercapto group, alkylthio group and alkyl gr...

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Bibliographische Detailangaben
Hauptverfasser:	HAMASHIMA, KENTARO, INAGAKI, HIDEKAZU
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DYES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PHYSICS POLISHES
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Beschreibung
Zusammenfassung:	OF THE DISCLOSUREA composition for polishing glass substrate comprising components (A), (B) and optionally (C) and/or (D), and polishing 5 slurry comprising the composition and abrasive grains.a tetrazole derivative having at least one group selected from mercapto group, alkylthio group and alkyl group,water,a high molecular polysaccharide,10 (D) an amine