APPARATUS AND METHOD FOR SURFACE TREATMENT IN A FURNACE
5 The present invention relates apparatus and methods for treating the surfaces ofsubstrates in a furnace to enhance the subsequent deposition of thin films or to enhance the reaction of the surfaces with gas phase components. Exhaust systems and methods of their use allow the exhaust gases to be co...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | 5 The present invention relates apparatus and methods for treating the surfaces ofsubstrates in a furnace to enhance the subsequent deposition of thin films or to enhance the reaction of the surfaces with gas phase components. Exhaust systems and methods of their use allow the exhaust gases to be conveyed to proper gastreatments facilities. Door seal and inert gas purge systems allow the furnace to be10 operated safely and minimize the reaction of the process gases in the door seal region.Figure 1 |
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