COMPOUND, COPOLYMER COMPRISING THE COMPOUND, AND RESIST PROTECTIVE FILM COMPOSITION COMPRISING THE COPOLYMER

Provided are a compound represented by the following formula (1), a copolymer5 including a repeating unit represented by the following formula (1-a), and a resist protective film composition containing the copolymer. When the resist protective film composition is used, there is obtained a resist pro...

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Hauptverfasser:	JOO, HYUN SANG, LIM, HYUN SOON, HAN, JOON HEE, PARK, JOO HYEON
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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