COMPOUND, COPOLYMER COMPRISING THE COMPOUND, AND RESIST PROTECTIVE FILM COMPOSITION COMPRISING THE COPOLYMER

Provided are a compound represented by the following formula (1), a copolymer5 including a repeating unit represented by the following formula (1-a), and a resist protective film composition containing the copolymer. When the resist protective film composition is used, there is obtained a resist protective film which has sufficient light transmissivity, is not easily intermixed with the resist film, has appropriate hydrophilic or hydrophobic characteristics, exhibits no phenomenon of pattern shape deterioration, is10 easily dissolved in alkali developer solutions, and can reduce the occurrence of various defects in the process of immersion or dry exposure.[Formula Ii [Formula 1-a] wherein in the formula (I) and the formula (I-a), Ri, R21 and R22 each independently15 represent a hydrogen atom, a halogen atom, or the like; R1 represents an alkyl group, a heteroalkyl group, or the like; R2 represents a hydrogen atom or an alkyl group; and Qi and Q2 each independently represent any one selected from the group consisting of a hydrogen atom and a halogen atom.