A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD
A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area...
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| creator | RIEPEN, MICHEL SHULEPOV, SERGEI CROMWIJK, JAN, WILLEM MA, ZHENHUA EVANGELISTA, FABRIZIO BESSEMS, DAVID STAVENGA, MARCO, KOERT LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS SMITS, MARCUS, AGNES, JOHANNES WITBERG, ERIK KEMPER, NICOLAAS, RUDOLF BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS GUNTER, PIETER, LEIN, JOSEPH LIEBREGTS, PAULUS, MARTINUS, MARIA JOSEN, MARINUS MULKENS, JOHANNES, CATHARINUS, HUBERTUS BELL, FRANCISCUS WILHELMUS MOERMAN, RICHARD LI, HUA EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA STEFFENS, KOEN MEIJERS, RALPH, JOSEPH |
| description | A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_SG164338A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>SG164338A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_SG164338A13</originalsourceid><addsrcrecordid>eNrjZEh0VPDxDPHwdw9yDPDwdFZwDAhwDHIMCQ3WUXBU8HUFyrgo-LspOPv7hQT5-_h4-rkrhHi4IpQpOPq5AFW6uIZ5Orsq-Dr6hbo5OoeEBoEUQrTzMLCmJeYUp_JCaW4GeTfXEGcP3dSC_PjU4oLE5NS81JL4YHdDMxNjYwtHQ2PCKgC2izKT</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>RIEPEN, MICHEL ; SHULEPOV, SERGEI ; CROMWIJK, JAN, WILLEM ; MA, ZHENHUA ; EVANGELISTA, FABRIZIO ; BESSEMS, DAVID ; STAVENGA, MARCO, KOERT ; LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS ; SMITS, MARCUS, AGNES, JOHANNES ; WITBERG, ERIK ; KEMPER, NICOLAAS, RUDOLF ; BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS ; GUNTER, PIETER, LEIN, JOSEPH ; LIEBREGTS, PAULUS, MARTINUS, MARIA ; JOSEN, MARINUS ; MULKENS, JOHANNES, CATHARINUS, HUBERTUS ; BELL, FRANCISCUS WILHELMUS ; MOERMAN, RICHARD ; LI, HUA ; EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA ; STEFFENS, KOEN ; MEIJERS, RALPH, JOSEPH</creator><creatorcontrib>RIEPEN, MICHEL ; SHULEPOV, SERGEI ; CROMWIJK, JAN, WILLEM ; MA, ZHENHUA ; EVANGELISTA, FABRIZIO ; BESSEMS, DAVID ; STAVENGA, MARCO, KOERT ; LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS ; SMITS, MARCUS, AGNES, JOHANNES ; WITBERG, ERIK ; KEMPER, NICOLAAS, RUDOLF ; BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS ; GUNTER, PIETER, LEIN, JOSEPH ; LIEBREGTS, PAULUS, MARTINUS, MARIA ; JOSEN, MARINUS ; MULKENS, JOHANNES, CATHARINUS, HUBERTUS ; BELL, FRANCISCUS WILHELMUS ; MOERMAN, RICHARD ; LI, HUA ; EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA ; STEFFENS, KOEN ; MEIJERS, RALPH, JOSEPH</creatorcontrib><description>A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100929&DB=EPODOC&CC=SG&NR=164338A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100929&DB=EPODOC&CC=SG&NR=164338A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RIEPEN, MICHEL</creatorcontrib><creatorcontrib>SHULEPOV, SERGEI</creatorcontrib><creatorcontrib>CROMWIJK, JAN, WILLEM</creatorcontrib><creatorcontrib>MA, ZHENHUA</creatorcontrib><creatorcontrib>EVANGELISTA, FABRIZIO</creatorcontrib><creatorcontrib>BESSEMS, DAVID</creatorcontrib><creatorcontrib>STAVENGA, MARCO, KOERT</creatorcontrib><creatorcontrib>LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS</creatorcontrib><creatorcontrib>SMITS, MARCUS, AGNES, JOHANNES</creatorcontrib><creatorcontrib>WITBERG, ERIK</creatorcontrib><creatorcontrib>KEMPER, NICOLAAS, RUDOLF</creatorcontrib><creatorcontrib>BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS</creatorcontrib><creatorcontrib>GUNTER, PIETER, LEIN, JOSEPH</creatorcontrib><creatorcontrib>LIEBREGTS, PAULUS, MARTINUS, MARIA</creatorcontrib><creatorcontrib>JOSEN, MARINUS</creatorcontrib><creatorcontrib>MULKENS, JOHANNES, CATHARINUS, HUBERTUS</creatorcontrib><creatorcontrib>BELL, FRANCISCUS WILHELMUS</creatorcontrib><creatorcontrib>MOERMAN, RICHARD</creatorcontrib><creatorcontrib>LI, HUA</creatorcontrib><creatorcontrib>EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA</creatorcontrib><creatorcontrib>STEFFENS, KOEN</creatorcontrib><creatorcontrib>MEIJERS, RALPH, JOSEPH</creatorcontrib><title>A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD</title><description>A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEh0VPDxDPHwdw9yDPDwdFZwDAhwDHIMCQ3WUXBU8HUFyrgo-LspOPv7hQT5-_h4-rkrhHi4IpQpOPq5AFW6uIZ5Orsq-Dr6hbo5OoeEBoEUQrTzMLCmJeYUp_JCaW4GeTfXEGcP3dSC_PjU4oLE5NS81JL4YHdDMxNjYwtHQ2PCKgC2izKT</recordid><startdate>20100929</startdate><enddate>20100929</enddate><creator>RIEPEN, MICHEL</creator><creator>SHULEPOV, SERGEI</creator><creator>CROMWIJK, JAN, WILLEM</creator><creator>MA, ZHENHUA</creator><creator>EVANGELISTA, FABRIZIO</creator><creator>BESSEMS, DAVID</creator><creator>STAVENGA, MARCO, KOERT</creator><creator>LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS</creator><creator>SMITS, MARCUS, AGNES, JOHANNES</creator><creator>WITBERG, ERIK</creator><creator>KEMPER, NICOLAAS, RUDOLF</creator><creator>BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS</creator><creator>GUNTER, PIETER, LEIN, JOSEPH</creator><creator>LIEBREGTS, PAULUS, MARTINUS, MARIA</creator><creator>JOSEN, MARINUS</creator><creator>MULKENS, JOHANNES, CATHARINUS, HUBERTUS</creator><creator>BELL, FRANCISCUS WILHELMUS</creator><creator>MOERMAN, RICHARD</creator><creator>LI, HUA</creator><creator>EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA</creator><creator>STEFFENS, KOEN</creator><creator>MEIJERS, RALPH, JOSEPH</creator><scope>EVB</scope></search><sort><creationdate>20100929</creationdate><title>A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD</title><author>RIEPEN, MICHEL ; SHULEPOV, SERGEI ; CROMWIJK, JAN, WILLEM ; MA, ZHENHUA ; EVANGELISTA, FABRIZIO ; BESSEMS, DAVID ; STAVENGA, MARCO, KOERT ; LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS ; SMITS, MARCUS, AGNES, JOHANNES ; WITBERG, ERIK ; KEMPER, NICOLAAS, RUDOLF ; BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS ; GUNTER, PIETER, LEIN, JOSEPH ; LIEBREGTS, PAULUS, MARTINUS, MARIA ; JOSEN, MARINUS ; MULKENS, JOHANNES, CATHARINUS, HUBERTUS ; BELL, FRANCISCUS WILHELMUS ; MOERMAN, RICHARD ; LI, HUA ; EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA ; STEFFENS, KOEN ; MEIJERS, RALPH, JOSEPH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SG164338A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>RIEPEN, MICHEL</creatorcontrib><creatorcontrib>SHULEPOV, SERGEI</creatorcontrib><creatorcontrib>CROMWIJK, JAN, WILLEM</creatorcontrib><creatorcontrib>MA, ZHENHUA</creatorcontrib><creatorcontrib>EVANGELISTA, FABRIZIO</creatorcontrib><creatorcontrib>BESSEMS, DAVID</creatorcontrib><creatorcontrib>STAVENGA, MARCO, KOERT</creatorcontrib><creatorcontrib>LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS</creatorcontrib><creatorcontrib>SMITS, MARCUS, AGNES, JOHANNES</creatorcontrib><creatorcontrib>WITBERG, ERIK</creatorcontrib><creatorcontrib>KEMPER, NICOLAAS, RUDOLF</creatorcontrib><creatorcontrib>BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS</creatorcontrib><creatorcontrib>GUNTER, PIETER, LEIN, JOSEPH</creatorcontrib><creatorcontrib>LIEBREGTS, PAULUS, MARTINUS, MARIA</creatorcontrib><creatorcontrib>JOSEN, MARINUS</creatorcontrib><creatorcontrib>MULKENS, JOHANNES, CATHARINUS, HUBERTUS</creatorcontrib><creatorcontrib>BELL, FRANCISCUS WILHELMUS</creatorcontrib><creatorcontrib>MOERMAN, RICHARD</creatorcontrib><creatorcontrib>LI, HUA</creatorcontrib><creatorcontrib>EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA</creatorcontrib><creatorcontrib>STEFFENS, KOEN</creatorcontrib><creatorcontrib>MEIJERS, RALPH, JOSEPH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RIEPEN, MICHEL</au><au>SHULEPOV, SERGEI</au><au>CROMWIJK, JAN, WILLEM</au><au>MA, ZHENHUA</au><au>EVANGELISTA, FABRIZIO</au><au>BESSEMS, DAVID</au><au>STAVENGA, MARCO, KOERT</au><au>LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS</au><au>SMITS, MARCUS, AGNES, JOHANNES</au><au>WITBERG, ERIK</au><au>KEMPER, NICOLAAS, RUDOLF</au><au>BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS</au><au>GUNTER, PIETER, LEIN, JOSEPH</au><au>LIEBREGTS, PAULUS, MARTINUS, MARIA</au><au>JOSEN, MARINUS</au><au>MULKENS, JOHANNES, CATHARINUS, HUBERTUS</au><au>BELL, FRANCISCUS WILHELMUS</au><au>MOERMAN, RICHARD</au><au>LI, HUA</au><au>EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA</au><au>STEFFENS, KOEN</au><au>MEIJERS, RALPH, JOSEPH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD</title><date>2010-09-29</date><risdate>2010</risdate><abstract>A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T11%3A06%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RIEPEN,%20MICHEL&rft.date=2010-09-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ESG164338A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |