A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area...

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Bibliographische Detailangaben
Hauptverfasser:	RIEPEN, MICHEL, SHULEPOV, SERGEI, CROMWIJK, JAN, WILLEM, MA, ZHENHUA, EVANGELISTA, FABRIZIO, BESSEMS, DAVID, STAVENGA, MARCO, KOERT, LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS, SMITS, MARCUS, AGNES, JOHANNES, WITBERG, ERIK, KEMPER, NICOLAAS, RUDOLF, BRANDS, GERT-JAN, GERARDUS, JOHANNES, THOMAS, GUNTER, PIETER, LEIN, JOSEPH, LIEBREGTS, PAULUS, MARTINUS, MARIA, JOSEN, MARINUS, MULKENS, JOHANNES, CATHARINUS, HUBERTUS, BELL, FRANCISCUS WILHELMUS, MOERMAN, RICHARD, LI, HUA, EUMMELEN, ERIK, HENRICUS, EGIDIUS, CATHARINA, STEFFENS, KOEN, MEIJERS, RALPH, JOSEPH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.