POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME

Disclosed are a polymer for a chemically amplified resist represented as [Chemical formula 1] , and a resist composition using the same. In the above Chemical formula 1, X represents vinyl ether derivatives or olefin derivatives, at least one of R1, R2, R3, and R4 is an alkyl group with 1 to 30 carb...

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Hauptverfasser: HYUNSANG JOO, JINHO KIM, YONGHWA HONG, CHANGSOO LEE
Format: Patent
Sprache:eng
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Zusammenfassung:Disclosed are a polymer for a chemically amplified resist represented as [Chemical formula 1] , and a resist composition using the same. In the above Chemical formula 1, X represents vinyl ether derivatives or olefin derivatives, at least one of R1, R2, R3, and R4 is an alkyl group with 1 to 30 carbon atoms containing at least one functional group of a hydrogen atom, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitryl group (-CN), and an aldehyde group, 1, m, n, o and p respectively represent repeating units, l represents a real number of 0.05 to 0.5, m and n respectively represent real numbers of 0.1 to 0.7, o and p respectively represent real numbers of 0 to 0.7, and a sum of 1, m, n, o and p is 1.