INTEGRATED CIRCUIT SYSTEM EMPLOYING SELECTIVE EPITAXIAL GROWTH TECHNOLOGY

An integrated circuit system that includes: providing a substrate; depositing a dielectric on the substrate; depositing an isolation dielectric on the dielectric; forming a trench through the isolation dielectric and the dielectric to expose the substrate; depositing a dielectric liner over the inte...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE JAMES, WOH LAI CHUNG, HUANG LIU, ZHAO LUN, WIDODO JOHNNY, CHOO HSIA LIANG, GAO WENZHI, MISHRA SHAILENDRA, ALEX SEE K.H
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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