LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD

Lithographic Apparatus and Contamination Removal or Prevention Method An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra- pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER DONCK, JACQUES, COR, JOHAN, VAN DEN DOOL, TEUNIS, CORNELIS, JANSEN, HANS, WATSO, ROBERT, DOUGLAS, SCHUH, NADJA, CROMWIJK, JAN, WILLEM, DE JONG, ANTHONIUS, MARTINUS, CORNELIS, PETRUS, VAN DER NET, ANTONIUS, JOHANNUS, LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS, WANTEN, PETER, FRANCISCUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Lithographic Apparatus and Contamination Removal or Prevention Method An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra- pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). [Fig 3]