SUBSTRATES AND METHODS OF USING THOSE SUBSTRATES

Substrates and Methods of Using Those Substrates A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support laye...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN DER DONCK, JACQUES, COR, JOHAN, VAN DER GRAAF, SANDRA, JANSEN, HANS, BOUCHOMS, IGOR, PETRUS, MARIA, BRULS, RICHARD, JOSEPH, ZOLDESI, CARMEN, JULIA, DE JONG, ANTHONIUS, MARTINUS, CORNELIS, PETRUS, VAN DEN BOGAARD, FREDERIK, JOHANNES, LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS, WANTEN, PETER, FRANCISCUS, VAN DER HEIJDEN, MARCUS, THEODOOR, WILHELMUS, GROENEWOLD, JAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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