NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS

NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-n...

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Hauptverfasser: POWELL, DAVID, B, HOPLA, RICHARD, RUSHKIN, ILAEYA, NAIINI, AHMAD, A, METIVIER, JON
Format: Patent
Sprache:eng
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Zusammenfassung:NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate. Figure: None