DRY REACTIVE ION ETCHING
DRY REACTIVE ION ETCHING A method of etching a wafer includes the steps of applying a dry film resist to a surface to be etched, curing the dry film resist, patterning the dry film resist to expose areas of the wafer to be etched, etching the wafer with a dry reactive ion etch and removing the remai...
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| Sprache: | eng |
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