LOW DIELECTRIC MATERIALS AND METHODS FOR MAKING SAME

Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. These materials are characterized as having a dielectric constant (K) a dielectric constant of about 3.7 or...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WEIGEL SCOTT JEFFREY, MACDOUGALL JAMES EDWARD, PETERSON BRIAN KEITH, KIRNER JOHN FRANCIS, DEIS THOMAS ALAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CHEMISTRY COMPOUNDS THEREOF CONDUCTORS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INORGANIC CHEMISTRY INSULATORS METALLURGY NON-METALLIC ELEMENTS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES
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