Lithographic apparatus, immersion projection apparatus and device manufacturing method

A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller (CON L ) to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset (PO) to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.