SANITARY FACILITY MEMBER

To provide a sanitary facility member having excellent ease of contamination removal and excellent persistence of ease of contamination removal. A sanitary facility member including: a base material, at least the surface of which includes a metal element; a metal oxide layer formed on the surface of...

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Bibliographische Detailangaben
Hauptverfasser: KOGA Ryo, UKIGAI Saori, HIJIKATA Ryojiro
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:To provide a sanitary facility member having excellent ease of contamination removal and excellent persistence of ease of contamination removal. A sanitary facility member including: a base material, at least the surface of which includes a metal element; a metal oxide layer formed on the surface of the base material; and an organic layer provided on the metal oxide layer; wherein the metal element is at least one element selected from the group consisting of Cr, Zr, and Ti, the metal oxide layer includes at least the metal element and an oxygen element, and the organic layer is bonded to the metal oxide layer by bonding (M-O-P bonding) of the metal element (M) and a phosphorus atom (P) of at least one group (X) selected from a phosphonic acid group, a phosphoric acid group, and a phosphinic acid group via an oxygen atom (O), the group X being bonded to a group R (where R is a hydrocarbon or a group having an atom other than carbon in 1 or 2 locations in a hydrocarbon group).