HYDROPHILIC AND ZETA POTENTIAL TUNABLE CHEMICAL MECHANICAL POLISHING PADS

In one implementation, a method of forming a porous polishing pad is provided. The method comprises depositing a plurality of composite layers with a 3D printer to reach a target thickness. Depositing the plurality of composite layers comprises dispensing one or more droplets of a curable resin prec...

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Bibliographische Detailangaben
Hauptverfasser: CHOCKALINGAM, Ashwin, PATIBANDLA, Nag B, MADHUSOODHANAN, Sudhakar, VORA, Ankit, NG, Hou T, GANAPATHIAPPAN, Sivapackia, REDFIELD, Daniel, FU, Boyi, BAJAJ, Rajeev
Format: Patent
Sprache:eng
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Zusammenfassung:In one implementation, a method of forming a porous polishing pad is provided. The method comprises depositing a plurality of composite layers with a 3D printer to reach a target thickness. Depositing the plurality of composite layers comprises dispensing one or more droplets of a curable resin precursor composition onto a support. Depositing the plurality of composite layers further comprises dispensing one or more droplets of a porosity-forming composition onto the support, wherein at least one component of the porosity-forming composition is removable to form the pores in the porous polishing pad.