VAPORIZER, SUBSTRATE TREATMENT APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

According to the art disclosed in the present application, provided is a vaporizer that is equipped with: a vaporization chamber, the inner surface of which is configured from a quartz member; and an atomizer unit, which is formed of a fluorine resin, and which atomizes a liquid raw material using a...

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Bibliographische Detailangaben
Hauptverfasser:	KAKUDA, Toru, TANAKA, Akinori, JODA, Takuya, OKUNO, Masahisa, HARA, Daisuke, HORII, Sadayoshi, TATENO, Hideto, TSUKAMOTO, Takashi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	According to the art disclosed in the present application, provided is a vaporizer that is equipped with: a vaporization chamber, the inner surface of which is configured from a quartz member; and an atomizer unit, which is formed of a fluorine resin, and which atomizes a liquid raw material using a carrier gas (atomization gas), and supplies the material to the inside of the vaporization chamber. The present art enables to eliminate, in the vaporizer for vaporizing the liquid raw material, occurrence of metal contamination due to reaction between the liquid raw material and the vaporizer configuration member in contact with the liquid raw material.