ETCHING SOLUTION FOR TUNGSTEN WORD LINE RECESS

OF THE DISCLOSURE ETCHING SOLUTION FOR TUNGSTEN WORD LINE RECESS Described herein is an etching solution suitable for both tungsten-containing metals and TiN-containing materials, which comprises: water; and one or more than one oxidizers; and one or more than one of the components selected from the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Wen Dar Liu, Jhih Kuei Ge, Yi-Chia Lee
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!