Method for Preparing Photomask Blank, Photomask Blank, Method for Preparing Photomask, Photomask, and Metallic Chromium Target
Method for Preparing Photomask Blank, Photomask Blank, Method for Preparing Photomask, Photomask, and Metallic Chromium Target 5 A method for preparing a photomask blank comprising a transparent substrate and a chromium-containing film contiguous thereto involves the step of depositing the chromium-...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | Method for Preparing Photomask Blank, Photomask Blank, Method for Preparing Photomask, Photomask, and Metallic Chromium Target 5 A method for preparing a photomask blank comprising a transparent substrate and a chromium-containing film contiguous thereto involves the step of depositing the chromium-containing film by sputtering a metallic chromium target having an Ag content of up to 1 ppm. When a photomask prepared from the photomask blank is repeatedly used in patternwise exposure to ArF excimer laser radiation, the number of defects formed on 10 the photomask is minimized. [FIG. 1] |
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