ANNEAL MODULE FOR SEMICONDUCTOR WAFERS

An anneal module for annealing semiconductor material wafers and similar substrates reduces particle contamination and oxygen ingress while providing uniform heating including for 500°C processes. The anneal module may include a process chamber formed in a metal body having internal cooling lines. A...

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Bibliographische Detailangaben
Hauptverfasser: VINCENT STEFFAN FRANCISCHETTI, GREGORY J. WILSON, KYLE M. HANSON, PAUL WIRTH, ROBERT B. MOORE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An anneal module for annealing semiconductor material wafers and similar substrates reduces particle contamination and oxygen ingress while providing uniform heating including for 500°C processes. The anneal module may include a process chamber formed in a metal body having internal cooling lines. A hot plate has a pedestal supported on a thermal choke on the body. A gas distributor in the lid over the hot plate flows gas uniformly over the wafer. A transfer mechanism moves a hoop to shift the wafer between the hot plate and a cold plate.