UHF plasmatron

UHF plasmatron

UHF plasmatron for production of finely divided powder, which contains a coaxial line connected to an energy source and two radial lines 5. The one common conductor of the radial lines 5 consists of a disk 6, which is connected to the central conductor 3 of the coaxial line. The other two conductors...

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Bibliographische Detailangaben
Hauptverfasser: IVAN IVANOVICH DEVYATKIN, VIKTOR IVANOVICH BERESTENKO, EVGENY ALEXEEVICH PETROV, LEONID NIKOLAEVICH PETROV, ZHAN IOSIFOVICH DZNELADZE, GEORGY VASILIEVICH LYSOV, VLADIMIR NIKOLAEVICH TROITSKY, ALEXANDR LAZAREVICH SURIS, NIKOLAI IVANOVICH CHEBANKOV, VLADIMIR IVANOVICH MATORIN
Format: Patent
Sprache:eng ; swe
Schlagworte:
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:UHF plasmatron for production of finely divided powder, which contains a coaxial line connected to an energy source and two radial lines 5. The one common conductor of the radial lines 5 consists of a disk 6, which is connected to the central conductor 3 of the coaxial line. The other two conductors of the radial lines 5 are comprised of the respective end surfaces of a cylinder 7, which surrounds the disk 6 and whose one end surface is connected to the outer conductor 8 of the coaxial line and whose other end surface is provided with a central hole, which accommodates a discharge chamber 4 secured to the end of the central conductor 3. The plasmatron also contains an inlet for feeding in the starting material, which consists of a probe which is introduced through the hollow central conductor 3 of the coaxial line.