A BARRIER FILM FOR A PACKAGING MATERIAL AND A PACKAGING MATERIAL

A BARRIER FILM FOR A PACKAGING MATERIAL AND A PACKAGING MATERIAL

A BS T R AC TA barrier film (1) for a paper or paperboard-based packaging material, said barrier film comprising a, MFC layer, (2) with a grammage in the range 20-100 g/m2, and a density higher than 650 kg/m3. The barrier film further comprises a PHA, dispersion coated, primer layer (3, 9) coated on...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CUNHA, Gisela, NYFLÖTT, Åsa, BACKFOLK, Kaj, NORDSTRÖM, Tommi
Format: Patent
Sprache:eng
Schlagworte:
IMPREGNATING OR COATING OF PAPER
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
PAPER NOT OTHERWISE PROVIDED FOR
PAPER-MAKING
PERFORMING OPERATIONS
PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D
PRODUCTION OF CELLULOSE
PULP COMPOSITIONS
TEXTILES
TRANSPORTING
TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A BS T R AC TA barrier film (1) for a paper or paperboard-based packaging material, said barrier film comprising a, MFC layer, (2) with a grammage in the range 20-100 g/m2, and a density higher than 650 kg/m3. The barrier film further comprises a PHA, dispersion coated, primer layer (3, 9) coated on at least one side of the MFC layer, wherein the primer layer has a coating weight 0.5-12 g/m2; the primer layer (3, 9) comprises a PHA type selected from the group consisting of PHB, PHBV, PHBH, P(3HB4HB), other copolymers of PHB, other homopolymers such as PHO, PHH, P3HP, and combinations thereof; and a thin vacuum deposited layer (4) coated on a first primer layer (3) which vacuum deposited layer has a thickness of 20-500 nm, the vacuum deposited layer comprises material selected from the group consisting of aluminum, magnesium, silicon, copper, aluminum oxides, magnesium oxides, silicon oxides and combinations thereof, preferably aluminum oxides.