WET CHEMICAL TREATMENT METHOD FOR DISK BLANKS

FIELD: wet chemical treatment of semiconductor disks and the like. SUBSTANCE: method involves supplying gas-saturated treatment medium onto disk blank; treatment medium is liquid homogeneously dispersed bubbles. EFFECT: facilitated procedure. Изобретение касается способа мокрой химической обработки...

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Hauptverfasser:	GJUNTER SHVAB, PETER ROMEDER, MAKS SHTADLER
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	FIELD: wet chemical treatment of semiconductor disks and the like. SUBSTANCE: method involves supplying gas-saturated treatment medium onto disk blank; treatment medium is liquid homogeneously dispersed bubbles. EFFECT: facilitated procedure. Изобретение касается способа мокрой химической обработки дисковых заготовок, в частности полупроводниковых дисков, с помощью омывания заготовки, насыщенной газом, обрабатывающей средой, представляющей собой жидкость с гомогенно диспергированными в ней газовыми пузырьками.