REACTOR FOR PLASMA-CHEMICAL ETCHING OF SEMICONDUCTOR STRUCTURES

FIELD: microelectronics.SUBSTANCE: invention relates to the field of microelectronics, in particular to reactors of high-density and high-frequency plasma processing, and can be used in the manufacture of semiconductor devices and integrated circuits. Essence of the invention lies in the fact that t...

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Bibliographische Detailangaben

Hauptverfasser:	Shubnikov Aleksandr Valerevich, Odinokov Vadi Vasilevich, Dolgopolov Vladimir Mironovich, Irakin Pavel Aleksandrovich, Logunov Konstantin Vladimirovich, Pavlov Georgij Yakovlevich, Biryukov Mikhail Georgievich
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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