SUBSTRATE FOR CHEMICAL VAPOUR DEPOSITION (CVD) OF DIAMOND AND METHOD FOR OBTAINING THEREOF

FIELD: chemistry.SUBSTANCE: invention relates to substrate for diamond coating, applied by chemical vapour deposition (CVD) method, method for its formation and electrode rod for formation of substrate by said method. Substrate contains base of carbide solid alloy or steel and layer, which contains...

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Bibliographische Detailangaben
Hauptverfasser:	RALCHENKO, VIKTOR G, BOLSHAKOV, ANDREJ, KHOSOMI, SATORU, ASHKINAZI, EVGENIJ E, LEVASHOV, EVGENIJ A, AZAROVA, EKATERINA V, ISIDZUKA, KHIROSI
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER METALLURGY PERFORMING OPERATIONS POWDER METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING WORKING METALLIC POWDER
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