TWO-DIMENSIONALLY ORDERED STRAIGHT-CHAIN CARBON FILM AND METHOD FOR PRODUCTION THEREOF
FIELD: chemistry.SUBSTANCE: invention can be used in electronics, power engineering and medicine. A two-dimensionally ordered straight-chain carbon film is obtained by sputtering through pulsed plasma evaporation of a graphite cathode. The film growing on a substrate, which is formed by parallel cha...
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| creator | STRELETSKIJ OLEG ANDREEVICH KHVOSTOV VALERIJ VLADIMIROVICH GUSEVA MAL'VINA BORISOVNA ALEKSANDROV ANDREJ FEDOROVICH SAVCHENKO NATAL'JA FEDOROVNA |
| description | FIELD: chemistry.SUBSTANCE: invention can be used in electronics, power engineering and medicine. A two-dimensionally ordered straight-chain carbon film is obtained by sputtering through pulsed plasma evaporation of a graphite cathode. The film growing on a substrate, which is formed by parallel chains of carbon atoms, simultaneously with sputtering, is stimulated with argon ions and further stabilised with hydrogen ions which are fed during condensation of carbon into the arc-discharge plasma.EFFECT: obtained films have thickness of up to a few micrometres, high anisotropy of electrophysical and physical-chemical properties.6 dwg,1 ex
Изобретение может быть использовано электронике, энергетике и медицине. Плёнку двумерно упорядоченного линейно-цепочечного углерода получают напылением методом импульсно-плазменного испарения графитового катода. Растущую на подложке пленку, образуемую параллельными цепочками углеродных атомов, одновременно с напылением стимулируют ионами аргона и дополнительно стабилизируют ионами водорода, вводимыми в процессе конденсации углерода в плазму дугового разряда. Полученные пленки имеют толщину до нескольких микрон, высокую анизотропию электрофизических и физико-химических характеристик. 6 ил., 1 пр. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_RU2564288C2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>RU2564288C2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_RU2564288C23</originalsourceid><addsrcrecordid>eNqNjDkOwjAQAN1QIOAP-wE35lBa4wNbsr1oswFRRREyFYJI4f8iBQ-gmmZmluLCV5Q2ZlfaiEWndAMk68hZaJl0PAWWJuhYwGg6YgEfUwZdLGTHAS14JDgT2s7wPAAOc4t-LRaP4TnVzY8rAd6xCbKO775O43Cvr_rpqVP7w041jVHbP5QvSjUwmw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TWO-DIMENSIONALLY ORDERED STRAIGHT-CHAIN CARBON FILM AND METHOD FOR PRODUCTION THEREOF</title><source>esp@cenet</source><creator>STRELETSKIJ OLEG ANDREEVICH ; KHVOSTOV VALERIJ VLADIMIROVICH ; GUSEVA MAL'VINA BORISOVNA ; ALEKSANDROV ANDREJ FEDOROVICH ; SAVCHENKO NATAL'JA FEDOROVNA</creator><creatorcontrib>STRELETSKIJ OLEG ANDREEVICH ; KHVOSTOV VALERIJ VLADIMIROVICH ; GUSEVA MAL'VINA BORISOVNA ; ALEKSANDROV ANDREJ FEDOROVICH ; SAVCHENKO NATAL'JA FEDOROVNA</creatorcontrib><description>FIELD: chemistry.SUBSTANCE: invention can be used in electronics, power engineering and medicine. A two-dimensionally ordered straight-chain carbon film is obtained by sputtering through pulsed plasma evaporation of a graphite cathode. The film growing on a substrate, which is formed by parallel chains of carbon atoms, simultaneously with sputtering, is stimulated with argon ions and further stabilised with hydrogen ions which are fed during condensation of carbon into the arc-discharge plasma.EFFECT: obtained films have thickness of up to a few micrometres, high anisotropy of electrophysical and physical-chemical properties.6 dwg,1 ex
Изобретение может быть использовано электронике, энергетике и медицине. Плёнку двумерно упорядоченного линейно-цепочечного углерода получают напылением методом импульсно-плазменного испарения графитового катода. Растущую на подложке пленку, образуемую параллельными цепочками углеродных атомов, одновременно с напылением стимулируют ионами аргона и дополнительно стабилизируют ионами водорода, вводимыми в процессе конденсации углерода в плазму дугового разряда. Полученные пленки имеют толщину до нескольких микрон, высокую анизотропию электрофизических и физико-химических характеристик. 6 ил., 1 пр.</description><language>eng ; rus</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOUNDS THEREOF ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INORGANIC CHEMISTRY ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MANUFACTURE OR TREATMENT THEREOF ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; METALLURGY ; NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS ; NANOTECHNOLOGY ; NON-METALLIC ELEMENTS ; PERFORMING OPERATIONS ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150927&DB=EPODOC&CC=RU&NR=2564288C2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150927&DB=EPODOC&CC=RU&NR=2564288C2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>STRELETSKIJ OLEG ANDREEVICH</creatorcontrib><creatorcontrib>KHVOSTOV VALERIJ VLADIMIROVICH</creatorcontrib><creatorcontrib>GUSEVA MAL'VINA BORISOVNA</creatorcontrib><creatorcontrib>ALEKSANDROV ANDREJ FEDOROVICH</creatorcontrib><creatorcontrib>SAVCHENKO NATAL'JA FEDOROVNA</creatorcontrib><title>TWO-DIMENSIONALLY ORDERED STRAIGHT-CHAIN CARBON FILM AND METHOD FOR PRODUCTION THEREOF</title><description>FIELD: chemistry.SUBSTANCE: invention can be used in electronics, power engineering and medicine. A two-dimensionally ordered straight-chain carbon film is obtained by sputtering through pulsed plasma evaporation of a graphite cathode. The film growing on a substrate, which is formed by parallel chains of carbon atoms, simultaneously with sputtering, is stimulated with argon ions and further stabilised with hydrogen ions which are fed during condensation of carbon into the arc-discharge plasma.EFFECT: obtained films have thickness of up to a few micrometres, high anisotropy of electrophysical and physical-chemical properties.6 dwg,1 ex
Изобретение может быть использовано электронике, энергетике и медицине. Плёнку двумерно упорядоченного линейно-цепочечного углерода получают напылением методом импульсно-плазменного испарения графитового катода. Растущую на подложке пленку, образуемую параллельными цепочками углеродных атомов, одновременно с напылением стимулируют ионами аргона и дополнительно стабилизируют ионами водорода, вводимыми в процессе конденсации углерода в плазму дугового разряда. Полученные пленки имеют толщину до нескольких микрон, высокую анизотропию электрофизических и физико-химических характеристик. 6 ил., 1 пр.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOUNDS THEREOF</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INORGANIC CHEMISTRY</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MANUFACTURE OR TREATMENT THEREOF</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>METALLURGY</subject><subject>NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS</subject><subject>NANOTECHNOLOGY</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PERFORMING OPERATIONS</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDkOwjAQAN1QIOAP-wE35lBa4wNbsr1oswFRRREyFYJI4f8iBQ-gmmZmluLCV5Q2ZlfaiEWndAMk68hZaJl0PAWWJuhYwGg6YgEfUwZdLGTHAS14JDgT2s7wPAAOc4t-LRaP4TnVzY8rAd6xCbKO775O43Cvr_rpqVP7w041jVHbP5QvSjUwmw</recordid><startdate>20150927</startdate><enddate>20150927</enddate><creator>STRELETSKIJ OLEG ANDREEVICH</creator><creator>KHVOSTOV VALERIJ VLADIMIROVICH</creator><creator>GUSEVA MAL'VINA BORISOVNA</creator><creator>ALEKSANDROV ANDREJ FEDOROVICH</creator><creator>SAVCHENKO NATAL'JA FEDOROVNA</creator><scope>EVB</scope></search><sort><creationdate>20150927</creationdate><title>TWO-DIMENSIONALLY ORDERED STRAIGHT-CHAIN CARBON FILM AND METHOD FOR PRODUCTION THEREOF</title><author>STRELETSKIJ OLEG ANDREEVICH ; KHVOSTOV VALERIJ VLADIMIROVICH ; GUSEVA MAL'VINA BORISOVNA ; ALEKSANDROV ANDREJ FEDOROVICH ; SAVCHENKO NATAL'JA FEDOROVNA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_RU2564288C23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; rus</language><creationdate>2015</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOUNDS THEREOF</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INORGANIC CHEMISTRY</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MANUFACTURE OR TREATMENT THEREOF</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>METALLURGY</topic><topic>NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS</topic><topic>NANOTECHNOLOGY</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PERFORMING OPERATIONS</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>STRELETSKIJ OLEG ANDREEVICH</creatorcontrib><creatorcontrib>KHVOSTOV VALERIJ VLADIMIROVICH</creatorcontrib><creatorcontrib>GUSEVA MAL'VINA BORISOVNA</creatorcontrib><creatorcontrib>ALEKSANDROV ANDREJ FEDOROVICH</creatorcontrib><creatorcontrib>SAVCHENKO NATAL'JA FEDOROVNA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>STRELETSKIJ OLEG ANDREEVICH</au><au>KHVOSTOV VALERIJ VLADIMIROVICH</au><au>GUSEVA MAL'VINA BORISOVNA</au><au>ALEKSANDROV ANDREJ FEDOROVICH</au><au>SAVCHENKO NATAL'JA FEDOROVNA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TWO-DIMENSIONALLY ORDERED STRAIGHT-CHAIN CARBON FILM AND METHOD FOR PRODUCTION THEREOF</title><date>2015-09-27</date><risdate>2015</risdate><abstract>FIELD: chemistry.SUBSTANCE: invention can be used in electronics, power engineering and medicine. A two-dimensionally ordered straight-chain carbon film is obtained by sputtering through pulsed plasma evaporation of a graphite cathode. The film growing on a substrate, which is formed by parallel chains of carbon atoms, simultaneously with sputtering, is stimulated with argon ions and further stabilised with hydrogen ions which are fed during condensation of carbon into the arc-discharge plasma.EFFECT: obtained films have thickness of up to a few micrometres, high anisotropy of electrophysical and physical-chemical properties.6 dwg,1 ex
Изобретение может быть использовано электронике, энергетике и медицине. Плёнку двумерно упорядоченного линейно-цепочечного углерода получают напылением методом импульсно-плазменного испарения графитового катода. Растущую на подложке пленку, образуемую параллельными цепочками углеродных атомов, одновременно с напылением стимулируют ионами аргона и дополнительно стабилизируют ионами водорода, вводимыми в процессе конденсации углерода в плазму дугового разряда. Полученные пленки имеют толщину до нескольких микрон, высокую анизотропию электрофизических и физико-химических характеристик. 6 ил., 1 пр.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MANUFACTURE OR TREATMENT THEREOF MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS NANOTECHNOLOGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | TWO-DIMENSIONALLY ORDERED STRAIGHT-CHAIN CARBON FILM AND METHOD FOR PRODUCTION THEREOF |
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