MANUFACTURING METHOD OF NANO- AND MICRO-SIZED SYSTEM OF SENSOR OF PHYSICAL VALUES WITH SPECIFIED POSITIVE TEMPERATURE COEFFICIENT OF RESISTANCE OF RESISTIVE ELEMENTS

FIELD: measurement equipment.SUBSTANCE: manufacturing method consists in the fact that on a planar side of an elastic element there formed by means of a vacuum sputtering method is a heterogeneous structure from nano- and micro-sized films of materials, which contains thin-film dielectric, resistive...

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Bibliographische Detailangaben

Hauptverfasser:	VASIL'EV VALERIJ ANATOL'EVICH, KHOSHEV ALEKSANDR VJACHESLAVOVICH
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRICITY RESISTORS
Online-Zugang:	Volltext bestellen
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