THIN-FILM SEMICONDUCTOR INJECTION LASER BASED ON MULTIPLE PASS SEMICONDUCTOR HETEROSTRUCTURE (VERSIONS)

FIELD: physics, optics. ^ SUBSTANCE: present invention pertains to semiconductor devices, and more specifically, to lasers based on multiple pass p-n heterostructures. The laser based on p-n multiple pass heterostructures, consists of a doped active area in the form of a semi-conductive layer with a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TISHIN JURIJ IVANOVICH, SIDOROVA LJUDMILA PETROVNA, BEKIREV UVINALIJ AFANAS'EVICH
Format: Patent
Sprache:eng ; rus
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator TISHIN JURIJ IVANOVICH
SIDOROVA LJUDMILA PETROVNA
BEKIREV UVINALIJ AFANAS'EVICH
description FIELD: physics, optics. ^ SUBSTANCE: present invention pertains to semiconductor devices, and more specifically, to lasers based on multiple pass p-n heterostructures. The laser based on p-n multiple pass heterostructures, consists of a doped active area in the form of a semi-conductive layer with a thickness of not less than two Debye lengths, located between wide-band gap layers of n- and p- conduction types. Thickness of the laser heterostructures is not less than 8-10 Debye lengths and does not exceed 20/40 microns and it is welded or glued on one of its contact surfaces to the lamel-carrier and electrically joined with it. ^ EFFECT: reduction of the value of the operating current and threshold current density, and also an increase in the external quantum efficiency and improvement in other laser characteristics. ^ 5 cl, 2 dwg
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_RU2351047C2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>RU2351047C2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_RU2351047C23</originalsourceid><addsrcrecordid>eNrjZEgP8fD003Xz9PFVCHb19XT293MJdQ7xD1Lw9PNydQ7x9PdT8HEMdg1ScAKSLgpArm-oT4hngI-rQoBjcDCaJg_XENcg_-CQICA3NMhVQSPMNSgYaEawJg8Da1piTnEqL5TmZlBwcw1x9tBNLciPTy0uSExOzUstiQ8KNTI2NTQwMXc2MiZCCQDSIjWt</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>THIN-FILM SEMICONDUCTOR INJECTION LASER BASED ON MULTIPLE PASS SEMICONDUCTOR HETEROSTRUCTURE (VERSIONS)</title><source>esp@cenet</source><creator>TISHIN JURIJ IVANOVICH ; SIDOROVA LJUDMILA PETROVNA ; BEKIREV UVINALIJ AFANAS'EVICH</creator><creatorcontrib>TISHIN JURIJ IVANOVICH ; SIDOROVA LJUDMILA PETROVNA ; BEKIREV UVINALIJ AFANAS'EVICH</creatorcontrib><description>FIELD: physics, optics. ^ SUBSTANCE: present invention pertains to semiconductor devices, and more specifically, to lasers based on multiple pass p-n heterostructures. The laser based on p-n multiple pass heterostructures, consists of a doped active area in the form of a semi-conductive layer with a thickness of not less than two Debye lengths, located between wide-band gap layers of n- and p- conduction types. Thickness of the laser heterostructures is not less than 8-10 Debye lengths and does not exceed 20/40 microns and it is welded or glued on one of its contact surfaces to the lamel-carrier and electrically joined with it. ^ EFFECT: reduction of the value of the operating current and threshold current density, and also an increase in the external quantum efficiency and improvement in other laser characteristics. ^ 5 cl, 2 dwg</description><language>eng ; rus</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090327&amp;DB=EPODOC&amp;CC=RU&amp;NR=2351047C2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090327&amp;DB=EPODOC&amp;CC=RU&amp;NR=2351047C2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TISHIN JURIJ IVANOVICH</creatorcontrib><creatorcontrib>SIDOROVA LJUDMILA PETROVNA</creatorcontrib><creatorcontrib>BEKIREV UVINALIJ AFANAS'EVICH</creatorcontrib><title>THIN-FILM SEMICONDUCTOR INJECTION LASER BASED ON MULTIPLE PASS SEMICONDUCTOR HETEROSTRUCTURE (VERSIONS)</title><description>FIELD: physics, optics. ^ SUBSTANCE: present invention pertains to semiconductor devices, and more specifically, to lasers based on multiple pass p-n heterostructures. The laser based on p-n multiple pass heterostructures, consists of a doped active area in the form of a semi-conductive layer with a thickness of not less than two Debye lengths, located between wide-band gap layers of n- and p- conduction types. Thickness of the laser heterostructures is not less than 8-10 Debye lengths and does not exceed 20/40 microns and it is welded or glued on one of its contact surfaces to the lamel-carrier and electrically joined with it. ^ EFFECT: reduction of the value of the operating current and threshold current density, and also an increase in the external quantum efficiency and improvement in other laser characteristics. ^ 5 cl, 2 dwg</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgP8fD003Xz9PFVCHb19XT293MJdQ7xD1Lw9PNydQ7x9PdT8HEMdg1ScAKSLgpArm-oT4hngI-rQoBjcDCaJg_XENcg_-CQICA3NMhVQSPMNSgYaEawJg8Da1piTnEqL5TmZlBwcw1x9tBNLciPTy0uSExOzUstiQ8KNTI2NTQwMXc2MiZCCQDSIjWt</recordid><startdate>20090327</startdate><enddate>20090327</enddate><creator>TISHIN JURIJ IVANOVICH</creator><creator>SIDOROVA LJUDMILA PETROVNA</creator><creator>BEKIREV UVINALIJ AFANAS'EVICH</creator><scope>EVB</scope></search><sort><creationdate>20090327</creationdate><title>THIN-FILM SEMICONDUCTOR INJECTION LASER BASED ON MULTIPLE PASS SEMICONDUCTOR HETEROSTRUCTURE (VERSIONS)</title><author>TISHIN JURIJ IVANOVICH ; SIDOROVA LJUDMILA PETROVNA ; BEKIREV UVINALIJ AFANAS'EVICH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_RU2351047C23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; rus</language><creationdate>2009</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>TISHIN JURIJ IVANOVICH</creatorcontrib><creatorcontrib>SIDOROVA LJUDMILA PETROVNA</creatorcontrib><creatorcontrib>BEKIREV UVINALIJ AFANAS'EVICH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TISHIN JURIJ IVANOVICH</au><au>SIDOROVA LJUDMILA PETROVNA</au><au>BEKIREV UVINALIJ AFANAS'EVICH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>THIN-FILM SEMICONDUCTOR INJECTION LASER BASED ON MULTIPLE PASS SEMICONDUCTOR HETEROSTRUCTURE (VERSIONS)</title><date>2009-03-27</date><risdate>2009</risdate><abstract>FIELD: physics, optics. ^ SUBSTANCE: present invention pertains to semiconductor devices, and more specifically, to lasers based on multiple pass p-n heterostructures. The laser based on p-n multiple pass heterostructures, consists of a doped active area in the form of a semi-conductive layer with a thickness of not less than two Debye lengths, located between wide-band gap layers of n- and p- conduction types. Thickness of the laser heterostructures is not less than 8-10 Debye lengths and does not exceed 20/40 microns and it is welded or glued on one of its contact surfaces to the lamel-carrier and electrically joined with it. ^ EFFECT: reduction of the value of the operating current and threshold current density, and also an increase in the external quantum efficiency and improvement in other laser characteristics. ^ 5 cl, 2 dwg</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; rus
recordid cdi_epo_espacenet_RU2351047C2
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
title THIN-FILM SEMICONDUCTOR INJECTION LASER BASED ON MULTIPLE PASS SEMICONDUCTOR HETEROSTRUCTURE (VERSIONS)
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T23%3A05%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TISHIN%20JURIJ%20IVANOVICH&rft.date=2009-03-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ERU2351047C2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true