EVAPORATOR OF MULTICOMPONENT SOLUTIONS

FIELD: chemistry. ^ SUBSTANCE: invention concerns evaporator of multicomponent solutions and can be applied in forming thin films of double, triple and more complex solutions. Evaporator includes gate, case of cup form, heater located at outer case surface side. Inner gate part enters inner case spa...

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Hauptverfasser:	KAZANSKIJ NIKOLAJ L'VOVICH, PODLIPNOV VLADIMIR VLADIMIROVICH, SOJFER VIKTOR ALEKSANDROVICH, KOLPAKOV VSEVOLOD ANATOL'EVICH, KOLPAKOV ANATOLIJ IVANOVICH
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	FIELD: chemistry. ^ SUBSTANCE: invention concerns evaporator of multicomponent solutions and can be applied in forming thin films of double, triple and more complex solutions. Evaporator includes gate, case of cup form, heater located at outer case surface side. Inner gate part enters inner case space and has conical form of height 0.9H>h>d, where H is the height of inner case space, h is the height of conical gate part, d is inner size of inner case space. Rectangular asperity with diametre D is made along generating line in top part of the gate to latch inner case space in closed state. ^ EFFECT: improved quality of thin multicomponent films due to forming directed flow of multicomponent solution atoms in full accord with its stechiometric composition, with simultaneous enhancement of atom distribution over the substrate surface. ^ 2 dwg