METHOD OF CLEANING LOW-RATE FILTER AND FILTER DESIGN

FIELD: process flows, filters. ^ SUBSTANCE: invention can be applied in water treatment systems for water filtering from suspended solids and organic impurities. Method of cleaning low-rate filter consists of cleaning of top part of filtering material of maximum thickness 40 cm by method of separate...

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Hauptverfasser: AKUL'SHIN MIKHAIL DMITRIEVICH, ZENTSOV VJACHESLAV NIKOLAEVICH, KHALIKOV TIMUR ALIMOVICH, PAVLOVA JULIJA SERGEEVNA, ZENTSOVA EHLLINA VJACHESLAVOVNA, KHANGIL'DIN RUSTEHM IL'DUSOVICH
Format: Patent
Sprache:eng ; rus
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Zusammenfassung:FIELD: process flows, filters. ^ SUBSTANCE: invention can be applied in water treatment systems for water filtering from suspended solids and organic impurities. Method of cleaning low-rate filter consists of cleaning of top part of filtering material of maximum thickness 40 cm by method of separate and successive cleaning of individual separated filter layers. Filter layers are cleaned by mechanical mixing of filtering material with its concurrent conversion to suspension state in upward flow of flush water. Filter design includes container, divided into two parts (top and bottom) by disperse cage; at that bottom part is filled with filtering material. The filter is provided with system to maintain minimum operating level of water above the top surface of filtering material. Top part of filtering material of maximum thickness 40 cm is divided to individual filtering layers, each limited by water sheet from the top and package that consists of protective cage, supporting gravel layer and drain cage in the bottom. Filter is also provided with cleaning mechanism for successive mixing of individual filtering layers, filtrate tank, flush and source water tanks and pipeline system with check valves for flush water supply and discharge with suspended solids to the sewerage system. ^ EFFECT: maintenance of filter rate in specified limits at high quality and efficiency of water treatment, increase filter run life, reduce labor and material expenses for filter cleaning and also prevent filter downtimes after cleaning. ^ 3 cl, 9 dwg