FACILITY FOR LACQUERING OF RESISTACE ELEMENT FRAMEWORK

FIELD: electricity. ^ SUBSTANCE: facility for lacquering of resistance element framework contains microwire handler, tank for lacquer, where inlet and outlet holes is implemented for framework. It is outfitted by two framework diameter measuring transducers, one of which is mounted in front is inlet...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PEREDREJ JURIJ MIKHAJLOVICH, PEREDREJ IRINA JUR'EVNA, KAPITUROV ROMAN VLADIMIROVICH
Format: Patent
Sprache:eng ; rus
Schlagworte:
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Beschreibung
Zusammenfassung:FIELD: electricity. ^ SUBSTANCE: facility for lacquering of resistance element framework contains microwire handler, tank for lacquer, where inlet and outlet holes is implemented for framework. It is outfitted by two framework diameter measuring transducers, one of which is mounted in front is inlet hole, and second is mounted behind outlet hole. Around of outlet hole a chamber filed by hydro-layer is made. External walls of outlet hole are implemented as taper off and at the end of outlet hole thin-walled corrugation is implemented. Outlet of the first transducer is connected to the first outlet of compare facility through the element of delay. Outlet of the second transducer is connected to the second outlet of compare facility. Outlets of compare facility are connected to inlets of differential pneumatic actuator. ^ EFFECT: invention extends precision of framework diameter of wired resistance element. ^ 5 dwg