METHOD OF SURFACE PREPARATION FOR PLASMA SPUTTERING OF COATINGS

FIELD: technological process. ^ SUBSTANCE: invention is related to methods of surface preparation for plasma sputtering of coatings and may be used for cleaning of different surfaces with abrasive materials. Method includes abrasive treatment of surface that is subject to sputtering with thermal abr...

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Bibliographische Detailangaben
Hauptverfasser:	TAT'MJANIN ANDREJ ALEKSANDROVICH, IVANOVSKIJ VLADIMIR SERGEEVICH, PETROV ALEKSANDR NIKOLAEVICH, KARTSEV SERGEJ VASIL'EVICH, GAVRILOV DMITRIJ ALEKSANDROVICH, EROFEEV MIKHAIL NIKOLAEVICH, SHAKHOV ALEKSANDR MIKHAJLOVICH
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GRINDING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS POLISHING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	FIELD: technological process. ^ SUBSTANCE: invention is related to methods of surface preparation for plasma sputtering of coatings and may be used for cleaning of different surfaces with abrasive materials. Method includes abrasive treatment of surface that is subject to sputtering with thermal abrasive jet directed at the angle of 40...45° to processed surface. Jet is formed from high-temperature gas flow with abrasive loose material with fraction size of 0.3 - 0.7 mm. Processing is carried out until surface roughness is 40-50 micrometer, at that the mentioned surface is heated with high-temperature flow of gases up to 70 - 210°C. ^ EFFECT: provision of high-quality adhesion of coating with surface subject to sputtering.