METHOD FOR ENHANCING DENSITY OF SUB-NANOSECOND ELECTRON BEAM

METHOD FOR ENHANCING DENSITY OF SUB-NANOSECOND ELECTRON BEAM

FIELD: charged particle beam generation for quantum electronics, cathode-luminescent analyses, plasma chemistry, and other fields. ^ SUBSTANCE: proposed method for enhancing density of sub-nanosecond electron beam that can be used in studying interaction between charged particle flow and some materi...

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Bibliographische Detailangaben
Hauptverfasser: BAKSHT EVGENIJ KHAIMOVICH, RYBKA DMITRIJ VLADIMIROVICH, TARASENKO VIKTOR FEDOTOVICH, LOMAEV MIKHAIL IVANOVICH
Format: Patent
Sprache:eng ; rus
Schlagworte:
BASIC ELECTRIC ELEMENTS
BASIC ELECTRONIC CIRCUITRY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
PULSE TECHNIQUE
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Zusammenfassung:FIELD: charged particle beam generation for quantum electronics, cathode-luminescent analyses, plasma chemistry, and other fields. ^ SUBSTANCE: proposed method for enhancing density of sub-nanosecond electron beam that can be used in studying interaction between charged particle flow and some material includes firing of volumetric high-voltage pulsed discharge in gas-filled gap between electrodes at reduced gas pressures P: Pmin