METHOD OF FORMATION OF THE MICRORELIEF ON THE POLYMERIC FILMS SURFACES

FIELD: chemical industry; other industries; methods of formation of the microrelief pattern on surfaces of the polymeric films. ^ SUBSTANCE: invention is pertaining to the field of formation of the microrelief pattern on surfaces of the polymeric films, which may be used in the capacity of the refle...

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Bibliographische Detailangaben
Hauptverfasser:	JARYSHEVA LARISA MIKHAJLOVNA, OLENIN ALEKSANDR VLADIMIROVICH, GROKHOVSKAJA TAT'JANA EVGEN'EVNA, BOL'SHAKOVA ANASTASIJA VLADIMIROVNA, KULEBJAKINA ALEFTINA IGOREVNA, BAKEEV NIKOLAJ FILIPPOVICH, VOLYNSKIJ ALEKSANDR L'VOVICH
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL MAKING GRANULES OR PREFORMS PERFORMING OPERATIONS PREPARATION OR PRETREATMENT OF THE MATERIAL TO BESHAPED PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIALCONTAINING PLASTICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	FIELD: chemical industry; other industries; methods of formation of the microrelief pattern on surfaces of the polymeric films. ^ SUBSTANCE: invention is pertaining to the field of formation of the microrelief pattern on surfaces of the polymeric films, which may be used in the capacity of the reflecting components, the components of the optoelectronic devices and the information display systems. The technical problem of the invention consists in simplification of the method of formation of the microrelief on the polymeric films surfaces. The indicated result is attained by that at formation of the microrelief on the polymeric films surfaces deposit at least on one of the sides of the polymeric film the coating out of the material, which is more rigid, than the polymer of the film with the subsequent effect on the film. In the capacity of the film use the biaxially oriented film, and the effect on it includes the serial fixation of the film dimension at least in one arbitrary selected direction and the annealing of the fixed film in the temperature interval from the temperature of the biaxial orientation of the film up to the melting point of the film polymer. At that they after the annealing conduct removal of the coating from the film surface. ^ EFFECT: invention ensures simplification of the method of formation of the microrelief on the polymeric films surfaces. ^ 2 dwg, 2 ex