METHOD FOR APPLYING PROTECTIVE FILM ON SURFACES OF PHOSPHOR PARTICLES

FIELD: electrical engineering; surface treatment of phosphor particles. ^ SUBSTANCE: proposed method that can be used for encapsulating phosphor particles to enhance their lighting and servicing parameters by producing continuous silicon dioxide film on their surfaces includes treatment of phosphor...

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Bibliographische Detailangaben
Hauptverfasser:	SAZONOVA I.N, RYZHKIN JU.S, MERKUSHEV O.M, GAVRILOV V.P, VEDERNIKOVA L.G, KOZLOV A.I, KLJUSHIN D.M
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES
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Beschreibung
Zusammenfassung:	FIELD: electrical engineering; surface treatment of phosphor particles. ^ SUBSTANCE: proposed method that can be used for encapsulating phosphor particles to enhance their lighting and servicing parameters by producing continuous silicon dioxide film on their surfaces includes treatment of phosphor particles with 0.5 and 4 mass percent sols of polysilicic acid synthesized by hydrolyses of tetraethoxysilane in 0.6 - 0.8 mass percent aqueous solution of ammonia. ^ EFFECT: enhanced lighting parameters and service life of phosphor. ^ 2 cl, 3 tbl