DEVICE FOR PRODUCING HIGH-FREQUENCY INDUCTION DISCHARGE

DEVICE FOR PRODUCING HIGH-FREQUENCY INDUCTION DISCHARGE

FIELD: gas-discharge engineering; spectroscopic analyses of gases and their mixtures in medical diagnostics; compact light sources manufacture. ^ SUBSTANCE: proposed device has sealed gas-discharge chamber with inductor which is, essentially, single wire whose ends are connected to high-frequency os...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZHURAVLEV S.S, DUBINOV A.E, IVANOV M.M, REPIN P.B
Format: Patent
Sprache:eng ; rus
Schlagworte:
BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:FIELD: gas-discharge engineering; spectroscopic analyses of gases and their mixtures in medical diagnostics; compact light sources manufacture. ^ SUBSTANCE: proposed device has sealed gas-discharge chamber with inductor which is, essentially, single wire whose ends are connected to high-frequency oscillator; inductor is made in the form of convex polygon frame; the latter has all polygon ribs and polygon proper has maximum two apexes whereto odd number of ribs are converging; inductor surface is covered with insulating layer. Polygon may be in the form of octahedron, cubic octahedron, icosidodecahedron, rhombic-cubic octahedron, or rhombic icosidodecahedron. ^ EFFECT: provision for spherical focusing of plasma and enhanced effectiveness of using energy injected in discharge. ^ 6 cl, 6 dwg