PHOTOLITHOGRAPHY LINE

FIELD: microelectronics. SUBSTANCE: proposed photolithography line has wafer charge module, blasting module, Ð steam treatment module, curing module, photoresist film producing module, heat treatment module, and discharge module. Photolithography line is adjustable to particular process route due to the fact that its modules are connected to control computer through cable system provided with seating points and connectors connected in definite manner dictating seating point number. Each module of line has control unit coupled with computer according to predetermined process program whose parameters are set by computer as well as identification unit that functions to identify number of seating point wherein module is mounted and to convey this number to computer, and the latter governs sequence of modules in line. Each module is coupled through communication unit with cable system which is physically connected to wafer transport mechanism. EFFECT: reduced time for line re-adjustment to particular process route; enhanced efficiency of process equipment use. 1 dwg