METHOD OF VACUUM ION-PLASMA COATING OF SUBSTRATE

FIELD: methods of manufacturing structures operating in power plants under extreme conditions. SUBSTANCE: method includes setting up of a difference in electrical potential between substrate and cathode, and cleaning of substrate surface by ion flux, reduction of difference of potentials and deposit...

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Bibliographische Detailangaben
Hauptverfasser:	DERKACH G.G, DODONOV A.I, KUZNETSOV I.A, PESTOV JU.A, PETROV V.P, GOLOSHCHAPOV F.A, SEMENOV V.N
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	FIELD: methods of manufacturing structures operating in power plants under extreme conditions. SUBSTANCE: method includes setting up of a difference in electrical potential between substrate and cathode, and cleaning of substrate surface by ion flux, reduction of difference of potentials and deposition of coating, annealing of coating by increase of difference of potentials. In this case, ion flux and flow of evaporating material coming from cathode to substrate is shielded. Cleaning is carried out by ions of inert gas. After cleaning, shields are withdrawn and coating is deposited with subsequent annealing repeatedly up to producing required coating thickness. EFFECT: increased coating density, strength of cohesion of coating with substrate, and coating homogeneity in thickness. 8 cl, 1 dwg