APPARATUS FOR GRINDING SEMICONDUCTOR PLATES
manufacture of semiconductor instruments, machine engineering. SUBSTANCE: apparatus has housing in the form of cylinder with central opening whose diameter is more than that of ground plate. Housing includes inner, mean and peripheral concentric annular pneumatic chambers closed from upwards by roun...
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creator | GREBENKIN O.M POPOV G.V BITJUKOV V.K ABRAMOV G.V |
description | manufacture of semiconductor instruments, machine engineering. SUBSTANCE: apparatus has housing in the form of cylinder with central opening whose diameter is more than that of ground plate. Housing includes inner, mean and peripheral concentric annular pneumatic chambers closed from upwards by round cover. Said chambers are connected in upper portions with lines for supplying compressed air. Drive unit for moving ground plate is in the form of stationary sleeve joined with round grinding abrasive member having central opening and with housing. In base of housing there are inclined tangential nozzles, vertical nozzles and inclined radial nozzles arranged along concentric circles. Tangential nozzles are inclined relative to tangent lines to circle of their arrangement and to surface of base and they are connected with inner pneumatic chamber. Vertical nozzles are connected with mean pneumatic chamber, radial nozzles are connected with peripheral pneumatic chamber and they are inclined relative to base surface. Pickup for detecting revolution number of ground plate is placed in base. Apparatus has no mechanically moving parts and it provides simultaneous cooling at grinding and at working plates made of semiconductor material with low physicomechanical properties. EFFECT: decreased number of rejected plates due to simple regulation of effort for pressing plates to grinding surface. 7 dwg |
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SUBSTANCE: apparatus has housing in the form of cylinder with central opening whose diameter is more than that of ground plate. Housing includes inner, mean and peripheral concentric annular pneumatic chambers closed from upwards by round cover. Said chambers are connected in upper portions with lines for supplying compressed air. Drive unit for moving ground plate is in the form of stationary sleeve joined with round grinding abrasive member having central opening and with housing. In base of housing there are inclined tangential nozzles, vertical nozzles and inclined radial nozzles arranged along concentric circles. Tangential nozzles are inclined relative to tangent lines to circle of their arrangement and to surface of base and they are connected with inner pneumatic chamber. Vertical nozzles are connected with mean pneumatic chamber, radial nozzles are connected with peripheral pneumatic chamber and they are inclined relative to base surface. Pickup for detecting revolution number of ground plate is placed in base. Apparatus has no mechanically moving parts and it provides simultaneous cooling at grinding and at working plates made of semiconductor material with low physicomechanical properties. EFFECT: decreased number of rejected plates due to simple regulation of effort for pressing plates to grinding surface. 7 dwg</description><edition>7</edition><language>eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20011027&DB=EPODOC&CC=RU&NR=2175283C1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20011027&DB=EPODOC&CC=RU&NR=2175283C1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GREBENKIN O.M</creatorcontrib><creatorcontrib>POPOV G.V</creatorcontrib><creatorcontrib>BITJUKOV V.K</creatorcontrib><creatorcontrib>ABRAMOV G.V</creatorcontrib><title>APPARATUS FOR GRINDING SEMICONDUCTOR PLATES</title><description>manufacture of semiconductor instruments, machine engineering. SUBSTANCE: apparatus has housing in the form of cylinder with central opening whose diameter is more than that of ground plate. Housing includes inner, mean and peripheral concentric annular pneumatic chambers closed from upwards by round cover. Said chambers are connected in upper portions with lines for supplying compressed air. Drive unit for moving ground plate is in the form of stationary sleeve joined with round grinding abrasive member having central opening and with housing. In base of housing there are inclined tangential nozzles, vertical nozzles and inclined radial nozzles arranged along concentric circles. Tangential nozzles are inclined relative to tangent lines to circle of their arrangement and to surface of base and they are connected with inner pneumatic chamber. Vertical nozzles are connected with mean pneumatic chamber, radial nozzles are connected with peripheral pneumatic chamber and they are inclined relative to base surface. Pickup for detecting revolution number of ground plate is placed in base. Apparatus has no mechanically moving parts and it provides simultaneous cooling at grinding and at working plates made of semiconductor material with low physicomechanical properties. EFFECT: decreased number of rejected plates due to simple regulation of effort for pressing plates to grinding surface. 7 dwg</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB2DAhwDHIMCQ1WcPMPUnAP8vRz8fRzVwh29fV09vdzCXUOAQoH-DiGuAbzMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JL4oFAjQ3NTIwtjZ0NjIpQAAEuXJOw</recordid><startdate>20011027</startdate><enddate>20011027</enddate><creator>GREBENKIN O.M</creator><creator>POPOV G.V</creator><creator>BITJUKOV V.K</creator><creator>ABRAMOV G.V</creator><scope>EVB</scope></search><sort><creationdate>20011027</creationdate><title>APPARATUS FOR GRINDING SEMICONDUCTOR PLATES</title><author>GREBENKIN O.M ; POPOV G.V ; BITJUKOV V.K ; ABRAMOV G.V</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_RU2175283C13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2001</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>GREBENKIN O.M</creatorcontrib><creatorcontrib>POPOV G.V</creatorcontrib><creatorcontrib>BITJUKOV V.K</creatorcontrib><creatorcontrib>ABRAMOV G.V</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GREBENKIN O.M</au><au>POPOV G.V</au><au>BITJUKOV V.K</au><au>ABRAMOV G.V</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS FOR GRINDING SEMICONDUCTOR PLATES</title><date>2001-10-27</date><risdate>2001</risdate><abstract>manufacture of semiconductor instruments, machine engineering. SUBSTANCE: apparatus has housing in the form of cylinder with central opening whose diameter is more than that of ground plate. Housing includes inner, mean and peripheral concentric annular pneumatic chambers closed from upwards by round cover. Said chambers are connected in upper portions with lines for supplying compressed air. Drive unit for moving ground plate is in the form of stationary sleeve joined with round grinding abrasive member having central opening and with housing. In base of housing there are inclined tangential nozzles, vertical nozzles and inclined radial nozzles arranged along concentric circles. Tangential nozzles are inclined relative to tangent lines to circle of their arrangement and to surface of base and they are connected with inner pneumatic chamber. Vertical nozzles are connected with mean pneumatic chamber, radial nozzles are connected with peripheral pneumatic chamber and they are inclined relative to base surface. Pickup for detecting revolution number of ground plate is placed in base. Apparatus has no mechanically moving parts and it provides simultaneous cooling at grinding and at working plates made of semiconductor material with low physicomechanical properties. EFFECT: decreased number of rejected plates due to simple regulation of effort for pressing plates to grinding surface. 7 dwg</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
title | APPARATUS FOR GRINDING SEMICONDUCTOR PLATES |
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