PHOTOPOLYMERIZABLE COMPOSITION FOR PHOTORESIST FILM

polymer production. SUBSTANCE: invention, in particular, relates to water-alkali development photoresist films finding use for creating image in production of printed circuit cards for radioelectronics necessities. Composition of invention contains, wt.pts: copolymer of styrene with monobutyl maleat...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	TRJAPITSYN S.A
Format:	Patent
Sprache:	eng
Schlagworte:	AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES
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