PHOTOPOLYMERIZABLE COMPOSITION FOR PHOTORESIST FILM

polymer production. SUBSTANCE: invention, in particular, relates to water-alkali development photoresist films finding use for creating image in production of printed circuit cards for radioelectronics necessities. Composition of invention contains, wt.pts: copolymer of styrene with monobutyl maleate with molecular weight 20000-35000, 3-8; bifunctional acrylate, 40-70; 2- chloro-3-hydroxymethacryloyloxypropane, 5-35; inhibitor, 0.001-0.1; photoinitiator, 3-8; colorant, 0.15-0.35; and product of condensation of ethylene glycol with dicarboxylic acid having general formula: HOOC-(A)-CO-(CH2-CH2-O-)-CO-(A)-COOH wherein A denotes tetramethylene, hexamethylene, or 1,2-phenylene group and m=1-3, 0.3-5.0. EFFECT: increased galvano-chemical stability of composition in copper plating electrolytes, including resistance to alkaline etching fluids. 1 tbl