POINT HIGH-INTENSITY SOURCE OF X-RAY RADIATION

X-ray microscopy. SUBSTANCE: invention refers to X-ray radiation sources having small effective size of radiation area and is intended for use in X-ray microscopes, microflaw detectors and X-ray tomographs. Point high-intensity source has electron emitter, electron focusing lenses and radiation leak...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LAZAREV P.I, KOMARDIN O.V
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	X-ray microscopy. SUBSTANCE: invention refers to X-ray radiation sources having small effective size of radiation area and is intended for use in X-ray microscopes, microflaw detectors and X-ray tomographs. Point high-intensity source has electron emitter, electron focusing lenses and radiation leakage anode that can be installed in window of radiation source and provided with aid for its cooling. Electron beam is focused in point or dash behind anode in path of electron beam. Pupil of diaphragm of X-ray radiation is positioned in focus of electron lens. EFFECT: diminished effective size of radiation region. 6 cl, 3 dwg