METHOD AND DEVICE FOR PRODUCING PHOTORESIST COATING

microelectronics; logarithmic operations in semiconductor device and integrated circuit manufacture. SUBSTANCE: method includes coating substrate with photoresist dose, shaping layer, and pre-drying it. Substrate is placed on swirling-air underlayer, accelerated to definite speed, covered with photo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	POPOV G.V, KOVALENKO V.B, BITJUKOV V.K, ABRAMOV G.V
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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