METHOD FOR PRODUCING THIN FILMS OF MULTICOMPONENT SOLID SOLUTIONS

semiconductor engineering. SUBSTANCE: method for producing thin semiconductor films of controlled-composition solid solutions including epitaxial ones from steam phase involves film evaporation onto heated substrate from charge vapors. Sublayer of charge vapors of evaporated composition, at least 40...

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Bibliographische Detailangaben
Hauptverfasser: MOISEENKO A.G, VASIL'KOV V.N, KASATKIN I.L, CHISHKO V.F, DIROCHKA A.I, KRAVCHENKO N.V
Format: Patent
Sprache:eng
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Zusammenfassung:semiconductor engineering. SUBSTANCE: method for producing thin semiconductor films of controlled-composition solid solutions including epitaxial ones from steam phase involves film evaporation onto heated substrate from charge vapors. Sublayer of charge vapors of evaporated composition, at least 40 atomic layers thick, is first to be deposited onto substrate under non-equilibrium conditions. Sublayer is subjected to isothermal baking in charge vapors and then temperature difference is set up between charge and substrate at which excess saturation of vapor is not over 2, whereupon main film is evaporated to desired thickness. Proposed technique makes it possible to obtain thin films of multicomponent solid solutions on various substrates their composition being close to that of source charge. EFFECT: improved regenerative ability.